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ICP Ether company Gigalane(gigalane.com) will unveil LED Etcher and MAXIS300L series for LED PSS and Gan Etch at LED EXPO & OLED EXPO 2013 , KINTEX, ILSAN from June 25th to 28th.
MAXIS300L is the equipment for Patterned Sapphire Substrate, Photonics Crystal and GaN etching process. The flat etching, excellent selection ration and stable hardware can guarantee the best productivity.
Gigalane is now developing and possessing the RIE, ICP and CCP type of plasma source. Also Gigalane has been certified with their excellent equipment in ICP Etcher field with Deep Silicon Etcher and ICP Etcher field.
Since 2006, Gigalane is managing MEMS FAB and possessing Deep Silicon Etch and its critical techology `Electro Plating` process.
The 11th LED EXPO & OLED EXPO 2013 (www.ledexpo.com) is expected to suggest the strategy to possess global competitiveness with LED, OLED, lights, equipment, material, research agency, related companies and organizations.
→ Go to LED EXPO &OLED EXPO 2013 Special page
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